New digital micromirror device with real-time correction enables equipment manufacturers to achieve high-resolution printing at scale, maximizing throughput and yield
What’s new
Texas Instruments is enhancing the next generation of digital lithography with the introduction of the DLP991UUV digital micromirror device (DMD), the company’s highest resolution direct imaging solution to date. With 8.9 million pixels, sub-micron resolution capabilities and a data rate of 110 gigapixels per second, the device eliminates the need for expensive mask technology while delivering the scalability, cost-effectiveness and precision needed for increasingly complex packaging.
Why it matters
Maskless digital lithography machines – which project light for etching circuit designs on materials without a photomask or high-end stencil – are becoming increasingly popular for the manufacturing of advanced packaging. Advanced packaging combines multiple chips and technologies into a single package, enabling high-computing applications, such as data centers and 5G, to have systems that are smaller, faster, and more power-efficient.
With TI DLP technology, system assembly equipment manufacturers can leverage maskless digital lithography to achieve the high-resolution printing at scale necessary for advanced packaging. The new DLP991UUV acts as a programmable photomask, offering precise pixel control with reliable high-speed performance.
“Just as we redefined cinema by enabling the transition from film to digital projection, TI’s DLP technology is once again at the forefront of a major industry shift,” said Jeff Marsh, vice president and general manager of DLP technology at TI. “We’re enabling the creation of maskless digital lithography systems that empower engineers around the world to breakthrough the current limits of advanced packaging and bring powerful computing solutions to market.”
